Using Chlorella Ohadii Algae Genes to Improve Plant Resistance to Photodamage
A photo damage resistant transgenic plant. Project ID : 8-2018-5702
Summary of the technology
A photo damage resistant transgenic plant.
Project ID : 8-2018-5702
Description of the technology
Photo damage is caused by excess light intensities, and leads to the disintegration of protein D1, a key protein in the Photosystem II (PSII) reaction center. In lower light intensities, the plant is able to overcome the damage, however, in the higher levels, the amount of energy the plant puts in the biosynthesis of new D1 protein reduces product yield (10-50%) in all plant types.
For decades, the process of photo damage was investigated, however until now, no solution has been found to overcome this problem.
Currently there are no known competitors for similar technologies, and the problem of photo damage is considered inevitable.
The invention is applicable for the agritech field. Due its large market and high sensitivity to photo damage, soy, for example, is an applicable choice for such technology.